lfreirraBRTVMebarova10−410−310−210−1MVTR[g/m2·day]MVTR10-3 unitsConventional vaporConventional vapordeposited barrier filmdeposited barrier film (high speed, low barrier) (high speed, low barrier)SuperSputtering/CVDSputtering/CVDSuper high-barrier filmSuper high-barrier film (low speed, high barrier) (low speed, high barrier)high-barrier film (developed product)Cost 1/5 (Toray estimate)high speedDeposition speedFilm SubstratesSinglematerial*low (position)*Made by the companyFilm Densitynewly developed goodscompoundhigh（g/m2·day）10−110−210−310−4Source: Toray Industries, Inc.can be performed, but the disadvan-tage is the slow deposition speed. On the other hand, vapor deposition is a method in which materials are heated to evaporate, and while it is good at high-speed film formation, the evapo-ration speed differs depending on the material, making simultaneous deposi-tion of multiple materials difficult, and prone to low-density film. The break-through this time was the discovery of multiple inorganic materials that easily form molecular bonds, and the devel-opment of a process that combines these materials to form a composite compound material, which is used as a film material.Incidentally, regarding the use of Materials Informatics (MI) in the dis-covery of materials, Mr. Osada com-mented, "Although we did not use MI this time, but Mr. Tokunaga discovered multiple inorganic material method through various trial and error in his experiments, we believe that the ex-perimental approach and MI should be pursued in parallel in the future.”Super high-barrier film based on PET film with a thickness of 50μm, which also has excellent flexibility, was subjected to a bending resistance test Combines film deposition speed and barrier propertiessputtered film to the high-speed vapor deposition technology used for barrier film for food packaging, etc., and has a high barrier performance of 10-3 g/m2 day, a water vapor transmission rate equivalent to that of the sputtering and CVD methods. The new film achieves a high barrier performance of 10-3 g/m2/day, which is equivalent to the water vapor transmission rate of the sput-tering and CVD methods. Moreover, the deposition speed is more than 100 times faster than the conventional sputtering method, and the cost is less than 1/5 of the conventional sputtering method. Mr. Yukihiro Tokunaga, a re-searcher at the Film Research Institute said, "This film can contribute to cost reduction in applications that require super-high barrier performance at the level of aluminum foil or thin-film glass. This is the first time in this industry to achieve this high-cost performance."Superior film density and barrier properties achieved by composite compound designExcellent transparency and flexibility39Breakthroughs are dis-covering combination and developing methodMr. Tokunaga explains, "Sputtering is a method in which ions accelerat-ed by plasma are bombarded onto a material to knock out particles. If the materials can be mixed, film formation Transparency equiva-lent to PET and good bending resistanceThe developed super-high-barrier film has high transparency, nearly color-less, with total light transmittance of 90.3% and haze of 0.5%. Spectropho-tometric measurements showed al-most no change from PET film without a barrier layer.
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