{"id":3152,"date":"2023-07-18T07:43:23","date_gmt":"2023-07-17T22:43:23","guid":{"rendered":"http:\/\/ctiweb.co.jp\/con\/en\/?p=3152"},"modified":"2023-07-18T07:43:23","modified_gmt":"2023-07-17T22:43:23","slug":"applied-materials-and-fraunhofer-ipms-launch-european-semiconductor-metrology-technology-hub","status":"publish","type":"post","link":"https:\/\/ctiweb.co.jp\/con\/en\/applied-materials-and-fraunhofer-ipms-launch-european-semiconductor-metrology-technology-hub","title":{"rendered":"Applied Materials and Fraunhofer IPMS launch European Semiconductor- Metrology Technology Hub"},"content":{"rendered":"\n
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Applied Materials\u2019 eBeam metrology equipment at cleanroom of Fraunhofer IPMS<\/figcaption><\/figure>\n\n\n\n
July 17, 2023--- Applied Materials, Inc., the leader in materials engineering solutions, and the Fraunhofer Institute for Photonic Microsystems IPMS, Germany\u00b4s leading advanced 300mm semiconductor research center, today announced a landmark collaboration to create Europe\u00b4s largest technology hub for semiconductor metrology and process analysis. To be located at the Center Nanoelectronic Technologies (CNT) of Fraunhofer IPMS in Dresden, the technology hub is situated in the heart of Silicon Saxony, Europe\u2019s largest semiconductor cluster. The hub will be equipped with Applied Materials\u2019 state-of-the-art eBeam metrology equipment, including its VeritySEM\u00ae CD-SEM (critical dimension scanning electron microscope) systems, and staffed by Applied engineers and R&D experts.

\u201cFraunhofer IPMS and its partners will benefit from access to Applied\u2019s industry-leading eBeam metrology systems\u201d, said Dr. Benjamin Uhlig-Lilienthal, Head of Business Unit Next Generation Computing at Fraunhofer IPMS. \u201cThe new technology hub will offer advanced wafer-level metrology in our industrial CMOS environment with Fraunhofer IPMS\u2019s unique ability to loop wafers directly with semiconductor manufacturers.\u201d
\u201cOur collaborative metrology hub will accelerate learning cycles and the development of new applications for the Fraunhofer Institute, Applied Materials and our customers and partners in Europe,\u201d said James Robson, Corporate Vice President for Applied Materials Europe.

\u201cThis unique technology hub will have the capability to test and qualify processes on a variety of substrate materials and wafer thicknesses critical to applications across the diverse European semiconductor landscape.\u201d Metrology is crucial in the production of microchips as it enables the accurate measurements needed to precisely monitor and control the quality of individual semiconductor manufacturing steps and sequences. Chipmakers use metrology equipment at critical points to help validate physical and electrical characteristics and maintain target yields.

*ICAPS = Internet of things, Communications, Automotive, Power and Sensors
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July 17, 2023--- Applied Materials, Inc., the leader in materials engineering solutions, and the Fraunhofer Institute for Photonic Microsystems IPMS, Germany\u00b4s leading advanced 300mm semiconductor research center, today announced a landmark collaboration to create Europe\u00b4s largest technology hub for semiconductor metrology and process analysis. To be located at the Center Nanoelectronic Technologies (CNT) of Fraunhofer IPMS in Dresden, the technology hub is situated in the heart of Silicon Saxony, Europe\u2019s largest semiconductor cluster. The hub will be equipped with Applied Materials\u2019 state-of-the-art eBeam metrology equipment, including its VeritySEM\u00ae CD-SEM (critical dimension scanning electron microscope) systems, and staffed by Applied engineers and R&D experts.\u201cFraunhofer IPMS and its partners will benefit from … Continue reading \"Applied Materials and Fraunhofer IPMS launch European Semiconductor- Metrology Technology Hub\"<\/span><\/a><\/p>\n","protected":false},"author":3,"featured_media":3154,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":[],"categories":[4],"tags":[10],"_links":{"self":[{"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/posts\/3152"}],"collection":[{"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/users\/3"}],"replies":[{"embeddable":true,"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/comments?post=3152"}],"version-history":[{"count":1,"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/posts\/3152\/revisions"}],"predecessor-version":[{"id":3155,"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/posts\/3152\/revisions\/3155"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/media\/3154"}],"wp:attachment":[{"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/media?parent=3152"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/categories?post=3152"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/ctiweb.co.jp\/con\/en\/wp-json\/wp\/v2\/tags?post=3152"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}