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2022/11/9

Shinko’s ‘UVU-W’ Ultrasonic Air Cleaner Corresponds to 10.9m Width for Film Production Line

An in-house exhibition of the cleaning system for a flexible packaging film production line was held in Shinko Co., Ltd. at the head office in Osaka, Japan. The company’s technological capabilities and high-precision processing have enabled it to achieve a maximum effective cleaning width of over 10,000 mm, which is the widest cleaning range among their cleaning systems.

The model unveiled this time was “UVU-W” before shipping to a customer. The structure of the cleaning part is divided into three compartments shown at the figure, and consists of the pressure head part on both sides and the vacuum head part in the center. The gap between the head and the web substrate is adjusted to be less than 2.0mm by a non-contact type, and an air knife with ultrasonic vibrations is blown down on the substrate to release foreign matters, and air containing foreign matters is sucked and recovered by a vacuum in the central part. Through delicate adjustment of the device, including the gap between the head and the substrate, the blown air does not scatter around and is recovered from the central suction port.

In addition, by using static electricity elimination with an ionizer installed in front of the cleaning head together, it is effective against foreign matter of 1.0μm or more.

The main feature of the device was that the largest effective cleaning width of the cleaner that the company had been working on was 9430mm, while this time it was the widest-ever device that had 10900mm. The longer the length of the cleaning head, the higher the machining accuracy is required in terms of the control of the amount of deflection in the fabrication.

Therefore, the 10900mm wide is realized by a single piece of the head without joints, which is not welded, etc. In addition, there are three major configurations of the cleaning system: the control unit, the air circulation generator and filter unit, and the cleaning unit.

A total of 54 participants from 18 companies in Japan and Taiwan in the three-day program. Incidentally, the cleaning system on display is to be delivered to a primary film manufacturer in China, and its application is to remove oligomers.

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